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10 results

Conference Proceedings

1. Strategies of optical proximity correction dedicated to chromeless phase lithography for 65 and 45 nm node

Winkler, T. ; Dettmann, W. ; Hennig, M. ; Koestler, W. ; Moukara, M. ; Thiele, J. ; Zeiler, K.

Pub. info.:	Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.476-487, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5754

Conference Proceedings

2. Contact layer printing using alternating phase-shifting masks: mask making, patterning results, and production implementation

Pforr, R. ; Dettmann, W. ; Eisenhut, M. ; Hennig, M. ; Hofmann, D. ; Thiele, J. ; Thielscher, G.

Pub. info.:	20th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.178-187, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5504

Conference Proceedings

3. Full-level alternating PSM for sub-100nm DRAM gate patterning

Pforr, R. ; Ahrens, M. ; Dettmann, W. ; Hennig, M. ; Koehle, R. ; Ludwig, B. ; Morgana, N. ; Thiele, J.

Pub. info.:	Optical Microlithography XVI. Part One pp.232-243, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

4. Image performance and mask characterization of 157-nm alternating phase-shifting mask

Chen, Y.-T. ; Meute, J. ; Dean, K.R. ; Stark, D.R. ; Schilz, C.M. ; Dettmann, W. ; Koehle, R. ; Schiessl, B. ; Degel, W.

Pub. info.:	Optical Microlithography XVI. Part One pp.618-628, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

5. Introduction of full-level alternating phase-shift mask technology into IC manufacturing

Thiele, J. ; Ahrens, M. ; Dettmann, W. ; Heissmeier, M. ; Hennig, M. ; Ludwig, B. ; Moukara, M. ; Pforr, R.

Pub. info.:	Optical Microlithography XV. Part One pp.89-97, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4691

Conference Proceedings

6. Fourier analysis of AIMS images for mask characterization

Koehle, R. ; Dettmann, W. ; Verbeek, M.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.545-554, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

7. Qualification of alternating PSM: defect inspection analysis in comparison to wafer printing results

Dettmann, W. ; Heumann, J.P. ; Hagner, T. ; Koehle, R. ; Rahn, S. ; Verbeek, M. ; Zarrabian, M. ; Weckesser, J. ; Hennig, M. ; Morgana, N.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.415-422, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

8. AltPSM inspection capability and printability of quartz defects

Heumann, J.P. ; Zarrabian, M. ; Hennig, M. ; Dettmann, W. ; Zurbrick, L.S. ; Lang, M.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part Two pp.1033-1040, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

9. Alternating phase-shifting masks: phase determination and impact of quartz defects- theoretical and experimental results

Griesinger, U.A. ; Dettmann, W. ; Hennig, M. ; Heumann, J.P. ; Koehle, R. ; Ludwig, R. ; Verbeek, M. ; Zarrabian, M.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology IX. pp.410-421, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4754

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Conference Proceedings

10. Defect inspection of quartz-PSMs: taking a leap forward

Heumann, J.P. ; Schurack, F. ; Dettmann, W. ; Zurbrick, L. ; Lang, M.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVIII. pp.346-354, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5375

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Author: Dettmann, W.