1.

Conference Proceedings
Conference Proceedings
1. IR spectroscopic ellipsometry for industrial characterization of semiconductors
Boher,P. ; Bucchia,M. ; Piel,J.P. ; Defranoux,C. ; Stehle,J.L. ; Pickering,C.
Pub. info.: Optical metrology roadmap for the semiconductor, optical, and data storage industries II : 2-3 August 2001 San Diego, USA.  pp.69-78,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4449
2.

Conference Proceedings
Conference Proceedings
2. High-accuracy characterization of antireflective coatings and photoresists by spectroscopic ellipsometry:a new tool for 300-mm-wafer technology
Boher,P. ; Defranoux,C. ; Bourtault,S. ; Stehle,J.L.P.
Pub. info.: In-line characterization, yield reliability, and failure analysis in microelectronics manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.4-15,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3743
3.

Conference Proceedings
Conference Proceedings
3. New method for determination of the photoresist Dill parameters using spectroscopic ellipsometry
Boher,P. ; Defranoux,C. ; Piel,J.P. ; Stehle,J.L.P.
Pub. info.: Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.92-103,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3741
4.

Conference Proceedings
Conference Proceedings
4. New purged UV spectroscopic ellipsometer to characterize thin films and multilayers at 157 nm
Boher,P. ; Piel,J.P. ; Evrard,P. ; Defranoux,C. ; Espinosa,M. ; Stehle,J.L.P.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.379-389,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
5.

Conference Proceedings
Conference Proceedings
5. Characterization of ultrathin gate dielectrics using combined grazing x-ray reflectance and spectroscopic ellipsometry
Boher,P. ; Piel,J.-P. ; Evard,P. ; Defranoux,C. ; Stehle,J.-L.P.
Pub. info.: Process and equipment control in microelectronic manufacturing II : 30-31 May, 2001, Edinburgh, UK.  pp.44-55,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4405
6.

Conference Proceedings
Conference Proceedings
6. Fine characterization of ITO layers by spectroscopic ellipsometry
Boher,P. ; Defranoux,C. ; Piel,J.P. ; Stehle,J.L. ; Suzuki,Y.
Pub. info.: International Symposium on Polarization Analysis and Applications to Device Technology.  pp.297-300,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2873
7.

Conference Proceedings
Conference Proceedings
7. Thickness and index measurements of 8-ｦﾌm liquid crystal gap between plates by spectroscopic ellipsometry
Defranoux,C. ; Stehle,J.L.
Pub. info.: International Symposium on Polarization Analysis and Applications to Device Technology.  pp.336-339,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2873
8.

Conference Proceedings
Conference Proceedings
8. Precise measurement of ARC optical indices in the deep-UV range by variable-angle spectroscopic ellipsometry
Boher,P. ; Stehle,J.L. ; Piel,J.P. ; Defranoux,C. ; Hennet,L.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XI.  pp.205-214,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3050
9.

Conference Proceedings
Conference Proceedings
9. Characterization of resists and antireflective coatings by spectroscopic ellipsometry in the UV and deep-UV range
Boher,P. ; Piel,J.P. ; Defranoux,C. ; Stehle,J.-L. ; Hennet,L.
Pub. info.: Optical Microlithography IX.  Part2  pp.608-620,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726
10.

Conference Proceedings
Conference Proceedings
10. Spectroscopic ellipsometry and photometry applied to color filter characterization
Defranoux,C. ; Piel,J.P. ; Stehle,J.L.
Pub. info.: International Symposium on Polarization Analysis and Applications to Device Technology.  pp.184-187,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2873