1.

Conference Proceedings
Conference Proceedings
1. Bottom antireflective coatings for ArF, KrF, and i-line applications: a comparison of theory, design, and lithographic aspects
Padmanaban, M. ; Ding, S. ; Ficner, S. A. ; Kang, W. -B. ; Khanna, D. N. ; Dammel, R. R.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.550-561,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
2.

Conference Proceedings
Conference Proceedings
2. Cycloolefin/maleic anhydride copolymers for 193-nm resist compositions
Rahman, M. D. ; Dammel, R. R. ; Cook, M. M. ; Ficner, S. A. ; Padmanaban, M. ; Oberlander, J. E. ; Durham, D. ; Klauck-Jacobs, A.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.1193-1200,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
3.

Conference Proceedings
Conference Proceedings
3. Lithographic process for high-resolution metal lift-off
Redd, R. ; Spak, M. A. ; Sagan, J. P. ; Lehar, O. P. ; Dammel, R. R.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.1341-1351,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
4.

Conference Proceedings
Conference Proceedings
4. Thermal phenomena in acrylic 193-nm resists
Paniez, P. J. ; Gally, S. ; Mortini, B. P. ; Rosilio, C. ; Sassoulas, P. -O. ; Dammel, R. R. ; Padmanaban, M. ; Klauck-Jacobs, A. ; Oberlander, J. E.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.1352-1363,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
5.

Conference Proceedings
Conference Proceedings
5. Pattern collapse and line width roughness reduction by surface conditioner solutions for 248-nm lithography
Padmanaban, M. ; Renfkiewicz, D. ; Lee, S. ; Hong, C. ; Lee, D. ; Rahman, D. ; Sakamuri, R. ; Dammel, R. R.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.252-260,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
6.

Conference Proceedings
Conference Proceedings
6. A new monocyclic fluoropolymer for 157-nm and 193-nm photoresists
Houlihan, F. ; Sakamuri, R. ; Hamilton, K. ; Dimerli, A. ; Rentkiewicz, D. ; Romano, A. ; Dammel, R. R. ; Wei, Y. ; Stepanenko, N. ; Sebald, M. ; Hohle, C. ; Conley, W. ; Miller, D. ; Itani, T. ; Shigematsu, M. ; Kawaguchi, E.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.554-563,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
7.

Conference Proceedings
Conference Proceedings
7. Study of the effect of amine additives on LWR and LER [6153-44]
Houlihan, F. M. ; Rentkiewicz, D. ; Lin, G. ; Rahman, D. ; Mackenzie, D. ; Timko, A. ; Kudo, T. ; Anyadiegwu, C. ; Thiyagarajan, M. ; Chiu, S. ; Romano, A. ; Dammel, R. R. ; Padmanaban, M.
Pub. info.: Advances in Resist Technology and Processing XXIII.  pp.615317-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6153
8.

Conference Proceedings
Conference Proceedings
8. Versatility in lithographic performance of advanced 193 nm contact hole resist [6153-86]
Kudo, T. ; Lin, G. ; Lee, D. ; Rahman, D. ; Timko, A. ; Mckenzie, D. ; Anyadiegwu, C. ; Chiu, S. ; Houlihan, F. ; Rentkiewicz, D. ; Dammel, R. R. ; Padmanaban, M. ; Biafore, J.
Pub. info.: Advances in Resist Technology and Processing XXIII.  pp.61532C-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6153
9.

Conference Proceedings
Conference Proceedings
9. Performanc of dry resist under wet conditions [6153-07]
Padmanaban, M ; Romano, A ; Lin, G. ; Chiu, S ; Timko, A ; Houlihan, F ; Rahman, D ; Chakrapani, S ; Kudo, T ; Dammel, R. R. ; Turnquest, K ; Rich, G ; Schuetter, S D ; Shedd T A ; Nellis G F
Pub. info.: Advances in Resist Technology and Processing XXIII.  pp.615307-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6153