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Conference Proceedings

1. The advanced mask CD MTT control using dry etch process for sub 65 nm tech

S. J. Jo ; H. Y. Jung ; D. W. Lee ; J. C. Shin ; J. Y. Jun

Pub. info.:	Photomask technology 2007. 1 pp.673008-1-673008-8, 2007. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6730

Conference Proceedings

2. Design and evaluation of corner compensation patterns for anisotropic etching

X. Chen ; D. W. Lee ; J. S. Park

Pub. info.:	Optical test and measurement technology and equipment. 3 pp.672364-1-672364-6, 2007. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6723

Conference Proceedings

3. Design for CD correction strategy using a resist shrink method via UV irradiation for defect-free photomask

J. H. Ryu ; D. W. Lee ; H. Y. Jung ; S. P. Kim ; O. Han

Pub. info.:	Photomask technology 2007. 1 pp.67300K-1-67300K-10, 2007. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6730

Conference Proceedings

4. High efficiency arrangement in comb-drive actuators

X. Chen ; D. W. Lee ; J. Ding

Pub. info.:	Design, manufacturing, and testing of micro- and nano-optical devices and systems : 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies : 8-12 July 2007, Chengdu, China. pp.67240Q-1-67240Q-6, 2007. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6724