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13 results

Conference Proceedings

1. Current imprint template commercial manufacturing capability for nanotechnology and existing semiconductor and MEMS markets [5931-62]

Maltabes, J. G. ; Mackay, S. ; Cottle, R.

Pub. info.:	Nanoengineering: fabrication, properties, optics, and devices II : 3-4 August, 2005, San Diego, California. pp.59311H-, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5931

Conference Proceedings

2. Mask cost analysis via write time estimation

Zhang, Y. ; Gray, R. ; Chou, S. ; Rockwell, B. ; Xiao, G. ; Kamberian, H. ; Cottle, R. ; Wolleben, A. ; Progler, C.

Pub. info.:	Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA. pp.313-318, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5756

Conference Proceedings

3. Manufacturability and printability of AAPSM with transparent etch stop layer [6281-54]

Cangemi, M. ; Philipsen, V. ; De Ruyter, R. ; Leunissen, L. ; Morgana, N. ; Sixt, P. ; Cangemi, M. ; Cottle, R. ; Kasprowicz, B.

Pub. info.:	EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany. pp.62810T-, 2006. Bellingham, Wash.,. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6281

Conference Proceedings

4. Tunable transmission phase mask options for 65/45nm node gate and contact processing

Kasprowicz, B. S. ; Conley, W. ; Ham, Y.-M. ; Cangemi, M. J. ; Morgana, N. ; Cottle, R. ; Progler, C. J. ; Wu, W. ; Litt, L. C. ; Cobb, J. ; Roman, B.

Pub. info.:	Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.1469-1477, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5754

Conference Proceedings

5. The effect of polarized 193nm irradiation on photomask haze formation

Kim, Y. D. ; Kang, H. B. ; Zhang, Y. ; Tran, C. ; Farrar, N. ; Qin, J. ; Rockwell, B. ; Cho, H. J. ; Cottle, R. ; Chan, D. ; Martin, P. ; Choi, S. S. ; Progler, C.

Pub. info.:	Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.1586-1590, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5754

Conference Proceedings

6. Dynamic laser speckle in optical projection lithography: causes, effects on CDU and LER, and possible remedies

Jhaveri, T. ; Cottle, R. ; Zhang, Y. ; Progler, C.

Pub. info.:	Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.274-284, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5754

Conference Proceedings

7. Validation of Nu-Flare e-beam emulation software in a simulation environment [5853-06]

Ritter, D. ; Brooker, P. ; Lewellen, J. ; Ham, Y.-M. ; Martin, P. ; Cottle, R.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.52-57, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

Conference Proceedings

8. A films based approach to intensity imbalance correction for 65 nm node c:PSM [5992-19]

Cottle, R. ; Sixt, P. ; Lassiter, M. ; Cangemi, M. ; Martin, P. ; Progler, C.

Pub. info.:	25th Annual BACUS Symposium on Photomask Technology. pp.59920J-, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5992

Conference Proceedings

9. High transmission mask technology for 45nm node imaging [6154-38]

Conley, W. ; Morgana, N. ; Kasprowicz, B. S. ; Cangemi, M. ; Lassiter, M. ; Litt, L. C. ; Cangemi, M. ; Cottle, R. ; Wu, W. ; Cobb, J. ; Ham, Y. -M. ; Lucas, K. ; Roman, B. ; Progler, C.

Pub. info.:	Optical Microlithography XIX. pp.615411-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6154

10.

Conference Proceedings

10. Rotation-induced measurement error by a CD-SEM

Jhaveri, T.K. ; Cottle, R.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVII. 2 pp.1161-1167, 2003. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5038

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Author: Cottle, R.