1.

Conference Proceedings
Conference Proceedings
1. Film stress changes during anodic bonding of NGL masks
Cotte,E.P. ; Schlax,M.P. ; Engelstad,R.L. ; Lovell,E.G. ; Brooks,C.J.
Pub. info.: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.515-524,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3997
2.

Conference Proceedings
Conference Proceedings
2. Predicting mechanical distortions in x-ray masks
Cotte,E.P. ; Engelstad,R.L. ; Lovell,E.G. ; Brooks,C.J.
Pub. info.: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California.  Part2  pp.429-440,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3676
3.

Conference Proceedings
Conference Proceedings
3. Numerical and experimental studies of pellicle-induced photomask distortions
Cotte,E.P. ; Engelstad,R.L. ; Lovell,E.G. ; Shkel,Y.M. ; Eschbach,F.O. ; Shu,E.Y. ; Tanzil,D. ; Calhoun,R.M.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.641-651,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
4.

Conference Proceedings
Conference Proceedings
4. Mask-related distortions of modified fused silica reticles for 157-nm lithography
Mikkelson,A.R. ; Abdo,A.Y. ; Cotte,E.P. ; Sohn,J. ; Engelstad,R.L. ; Lovell,E.G.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.914-925,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
5.

Conference Proceedings
Conference Proceedings
5. Mechanical analysis of hard pellicles for 157-nm lithography
Reu,P.L. ; Mikkelson,A.R. ; Schlax,M.P. ; Cotte,E.P. ; Siewert,L.K. ; Engelstad,R.L. ; Lovell,E.G. ; Dao,G.T. ; Zheng,J.-F.
Pub. info.: Optical Microlithography XIV.  4346  pp.1166-1174,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346