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12 results

Conference Proceedings

1. Control methodology of off-target for varying pattern densities with chrome dry etch

Hochmuth,J. ; Ruhl,G.G. ; Coleman,T.P.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.297-306, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

2. Plasma etching of Cr photomasks:parametric comparisons of plasma sources and process conditions

Constantine,C. ; Johnson,D.J. ; Westerman,R.J. ; Coleman,T.P. ; Faure,T.

Pub. info.:	Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan. pp.11-18, 1997. Bellingham, Washington. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3096

Conference Proceedings

3. Comparison of EBR-900 M1 and ZEP 7000 with plasma-etch processing for MEBES 4500S

Coleman,T.P. ; Alexander,D. ; Lu,M.

Pub. info.:	17th Annual BACUS Symposium on Photomask Technology and Management. pp.397-404, 1998. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3236

Conference Proceedings

4. Plasma etching of Cr films in the fabrication of photomasks:II.a comparison of etch technologies and a first look at defects

Coleman,T.P. ; Buck,P.D. ; Johnson,D.J.

Pub. info.:	16th Annual BACUS Symposium on Photomask Technology and Management. pp.92-102, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2884

Conference Proceedings

5. Plasma etching of chromium films in the fabrication of photomasks

Coleman,T.P. ; Buck,P.D.

Pub. info.:	15th Annual BACUS Symposium on Photomask Technology and Management. pp.62-72, 1995. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2621

Conference Proceedings

6. Plasma etching of Cr photomasks: optimization of process conditions and CD control

Constantine,C. ; Johnson,D.J. ; Westerman,R.J. ; Coleman,T.P. ; Faure,T. ; Dubuque,L.F.

Pub. info.:	17th Annual BACUS Symposium on Photomask Technology and Management. pp.94-103, 1998. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3236

Conference Proceedings

7. 180-nm mask fabrication process using ZEP 7000,multipass gray,GHOST,and dry etch for MEBES 5000

Lu,M. ; Coleman,T.P. ; Sauer,C.A.

Pub. info.:	18th Annual BACUS Symposium on Photomask Technology and Management. pp.98-110, 1998. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3546

Conference Proceedings

8. Impact of the loading effect on CD control in plasma etching of Cr photomasks using ZEP 7000 resist

Chen,F. ; Tsai,W. ; Chegwidden,S. ; Yu,S. ; Kamna,M. ; Farnsworth,J.N. ; Coleman,T.P.

Pub. info.:	18th Annual BACUS Symposium on Photomask Technology and Management. pp.429-437, 1998. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3546

Conference Proceedings

9. Performance of the ALTA 3500 scanned-laser mask lithography system

Buck,P.D. ; Buxbaum,A.H. ; Coleman,T.P. ; Tran,L.

Pub. info.:	Photomask and X-Ray Mask Technology V. pp.67-78, 1998. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3412

10.

Conference Proceedings

10. Further advances in electron-beam pattern generation technology for 180-nm masks

Abboud,F.E. ; Sauer,C.A. ; Vernon,M. ; Coleman,T.P. ; Dean,R.L. ; Wang,W. ; Prior,R. ; Lu,M. ; Weaver,S.

Pub. info.:	Photomask and X-Ray Mask Technology V. pp.20-32, 1998. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3412

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