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14 results

Conference Proceedings

1. Impact of mask errors on full chip error budgets

Schellenberg,F.M. ; Boksha,V.V. ; Cobb,N.B. ; Lai,J.C. ; Chen,C.H. ; Mack,C.A.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part1 pp.261-275, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

2. Phase aware proximity correction for advanced masks

Toublan,O. ; Sahouria,E.Y. ; Cobb,N.B. ; Do,T. ; Donnelly,T. ; Granik,Y. ; Schellenberg,F.M. ; Schiavone,P.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.160-170, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

3. Integration of optical proximity correction strategies in strong phase shifters design for poly-gate layers

Spence,C.A. ; Plat,M.V. ; Sahouria,E.Y. ; Cobb,N.B. ; Schellenberg,F.M.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.277-287, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

4. OPC beyond 0.18 ｦﾌm:OPC on PSM gates

Schellenberg,F.M. ; Toublan,O. ; Cobb,N.B. ; Sahouria,E.Y. ; Hughes,G.P. ; MacDonald,S.S. ; West,C.A.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.1062-1069, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

5. Effects of advanced illumination schemes on design manufacturability and interactions with optical proximity corrections

Capodieci,L. ; Torres,J.A. ; Socha,R.J. ; Hollerbach,U. ; Chen,J.F. ; Os,C.van ; Granik,Yu. ; Toublan,O. ; Cobb,N.B.

Pub. info.:	Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA. pp.58-67, 2000. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4181

Conference Proceedings

6. Fast sparse aerial-image calculation for OPC

Cobb,N.B. ; Zakhor,A.

Pub. info.:	15th Annual BACUS Symposium on Photomask Technology and Management. pp.534-545, 1995. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2621

Conference Proceedings

7. Fully automatic side lobe detection and correction technique for attenuated phase-shift masks

Toublan,O. ; Cobb,N.B. ; Sahouria,E.Y.

Pub. info.:	Optical Microlithography XIV. 4346 pp.1541-1547, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

Conference Proceedings

8. Integration of optical proximity correction strategies in strong phase-shifter design for polygate layers

Spence,C.A. ; Plat,M.V. ; Sahouria,E.Y. ; Cobb,N.B. ; Schellendberg,F.M.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VII. pp.650-660, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4066

Conference Proceedings

9. CD variation analysis technique and its application to the study of PSM mask misalignment

Granik,Y. ; Cobb,N.B. ; Sahouria,E.Y.

Pub. info.:	20th Annual BACUS Symposium on Photomask Technology. pp.853-861, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4186

10.

Conference Proceedings

10. Phase and transmission errors aware OPC solution for PSM: feasability demonstration

Toublan,O. ; Sahouria,E.Y. ; Cobb,N.B.

Pub. info.:	20th Annual BACUS Symposium on Photomask Technology. pp.862-868, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4186

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Author: Cobb,N.B.