1.

Conference Proceedings
Conference Proceedings
1. Bremsstrahlung emission and absorption in electron projection lithography
Hector,S.D. ; Cobb,J.L. ; Ivin,V. ; Silakov,M.V. ; Babushkin,G.
Pub. info.: Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA.  pp.95-106,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4343
2.

Conference Proceedings
Conference Proceedings
2. Quasi-particle tunneling spectroscopy of high-Tc cuprates
Zasadzinski,J. ; Ozyuzer,L. ; Yusof,Z. ; Chen,J. ; Gray,K.E. ; Mogilevsky,R. ; Hinks,D.G. ; Cobb,J.L. ; Markert,J.T.
Pub. info.: Spectroscopic Studies of Superconductors Part B : Tunneling,Photoelectron,and Other Spectra : 29 January - 1 February 1996, San Jose, California.  PartB  pp.338-346,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2696
3.

Conference Proceedings
Conference Proceedings
3. Defects and metrology of ultrathin resist films
Okoroanyanwu,U. ; Cobb,J.L. ; Dentinger,P.M. ; Henderson,C.C. ; Rao,V. ; Monahan,K.M. ; Luo,D. ; Pike,C.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.515-526,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
4.

Conference Proceedings
Conference Proceedings
4. Ultrathin photoresists for EUV lithography
Rao,V. ; Cobb,J.L. ; Henderson,C.C. ; Okoroanyanwu,U. ; Bozman,D.R. ; Mangat,P.J. ; Brainard,R.L. ; Mackevich,J.
Pub. info.: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California.  Part2  pp.615-626,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3676
5.

Conference Proceedings
Conference Proceedings
5. Integration of ultrathin resist processes into MPU IC manufacturing flows
Cobb,J.L. ; Conley,W. ; Guenther,T. ; Huang,F. ; Lee,J.J. ; Lii,T. ; Dakshina-Murthy,S. ; Parker,C. ; Usmani,S. ; Wu,W. ; Hector,S.D.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.261-272,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345