1.

Conference Proceedings
Conference Proceedings
1. THE MECHANISM OF POLY-Si ETCHING DURING POLY/W GATE CLEANING BY FLUORINE BASED CLEANING SOLUTION
Kim, S.Y. ; Choi, S.J. ; Hong, C.K. ; Han, W.S. ; Moon, J.T.
Pub. info.: Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium.  pp.129-134,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-26
2.

Conference Proceedings
Conference Proceedings
2. Bus-coupled microresonator lasers (Invited Paper)
Choi, S.-J. ; Peng, Z. ; Yang, Q. ; Choi, S.J. ; Dapkus, P.D.
Pub. info.: Novel In-Plane Semiconductor Lasers IV.  pp.285-294,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5738
3.

Conference Proceedings
Conference Proceedings
3. Investigation of Cr defect in high Cr load logic mask
Jung, H.-Y. ; Choi, S.J. ; Kim, M.-S. ; Lee, D.W. ; Lee, J. ; Han, O.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.38-45,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
4.

Conference Proceedings
Conference Proceedings
4. Explanation of LER using the concept of gel layer in chemically amplified photoresists
Cho, J.Y. ; Choi, S.J. ; Choi, Y.J. ; Kim, H.L. ; Kim, K.H.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.782-789,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376