1.

Conference Proceedings
Conference Proceedings
1. Analysis of dry etch loading effect in mask fabrication
Lee,J.-Y. ; Cho,S.-Y. ; Kim,C.-H. ; Lee,S.-W. ; Choi,S.-W. ; Han,W.-S. ; Sohn,J.-M.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.609-615,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
2.

Conference Proceedings
Conference Proceedings
2. Extended capability of laser writer for masks beyond 180-nm nodes
Cho,S.-Y. ; Lee,J.-Y. ; Kim,C.-H. ; Choi,S.-W. ; Han,W.-S. ; Sohn,J.-M.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.9-15,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
3.

Conference Proceedings
Conference Proceedings
3. Line-width variation with different sublayers for 0.25-ｦﾌm minimum feature size in DUV lithography
Oh,H.-K. ; Cho,S.-Y. ; Jeong,Y.-U. ; Kang,H.-Y. ; Lee,G.-S. ; An,I. ; Park,I.-H.
Pub. info.: Optical Microlithography X.  pp.215-224,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051