1.

Conference Proceedings
Conference Proceedings
1. Comparative study on MEEF and dose latitude between attenuated PSM and Cr Binary masks
Cho,H.-J. ; Kim,Y.-H. ; Choi,S.-W. ; Han,W.-S. ; Sohn,J.-M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.17-23,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
2.

Conference Proceedings
Conference Proceedings
2. Current status of mask CD uniformity as related to e-beam system
Lim,S.-C. ; Kim,B.-G. ; Choi,S.-W. ; Lee,K.-H. ; Cho,H.-J. ; Yu,Y.-H. ; Cho,H.-K. ; Sohn,J.-M.
Pub. info.: 17th Annual BACUS Symposium on Photomask Technology and Management.  pp.301-311,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3236