1.

Conference Proceedings
Conference Proceedings
1. Enhancement of process latitude by reducing resist thickness for KrF excimer laser lithography
Asano,M. ; Maruyama,Y. ; Koike,T. ; Chiba,K. ; Shiobara,E. ; Ikeda,T.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 2  pp.869-879,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
2.

Conference Proceedings
Conference Proceedings
2. Detection and repair of multiphase defects on alternating phase-shift masks for DUV Lithography
Nagashige,S. ; Hayashi,K. ; Akima,S. ; Takahashi,H. ; Chiba,K. ; Yamada,Y. ; Matsuzawa,Y.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.127-137,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
3.

Conference Proceedings
Conference Proceedings
3. Low-noise readout circuit for uncooled infrared FPA
Tanaka,A. ; Chiba,K. ; Endoh,T. ; Okuyama,K. ; Kawahara,A. ; Iida,K. ; Tsukamoto,N.
Pub. info.: Infrared technology and applications XXVI : 30 July - 3 August 2000, San Diego, USA.  pp.160-167,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4130
4.

Conference Proceedings
Conference Proceedings
4. Line-edge roughness of chemically amplified resists
Azuma,T. ; Chiba,K. ; lmabeppu,M. ; Kawamura,D. ; Onishi,Y.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.264-269,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
5.

Conference Proceedings
Conference Proceedings
5. Quarter-and subquarter-micron deep-UV lithography with chemically amplified positive resist
Onishi,Y. ; Sato,K. ; Chiba,K. ; Asano,M. ; Niki,H. ; Hayase,R.H. ; Hayashi,T.
Pub. info.: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.70-81,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2724
6.

Conference Proceedings
Conference Proceedings
6. Optimization of ArF alternating phase-shifting mask structure for 100-nm node and inspection of phase defects
Chiba,K. ; Takahashi,H. ; Nozaki,W. ; Akima,S. ; Nagashige,S. ; Yamada,Y.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.430-440,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
7.

Conference Proceedings
Conference Proceedings
7. Tritone PSM and its performance
Kohzuma,M. ; Chiba,K. ; Unno,H. ; Kikuchi,Y. ; Yamada,Y. ; Otaki,M.
Pub. info.: 17th Annual BACUS Symposium on Photomask Technology and Management.  pp.250-263,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3236
8.

Conference Proceedings
Conference Proceedings
8. Actual use of phase-shift mask
Yamada,Y. ; Unno,H. ; Chiba,K. ; Karikawa,E. ; Kikuchi,Y. ; Hattori,Y. ; Kinemura,K.
Pub. info.: 15th Annual BACUS Symposium on Photomask Technology and Management.  pp.266-272,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2621