1.

Conference Proceedings
Conference Proceedings
1. Challenges in high NA, polarization, and photoresists
Smith, B.W. ; Cashmore, J.S.
Pub. info.: Optical Microlithography XV.  Part One  pp.11-24,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
2.

Conference Proceedings
Conference Proceedings
2. 157-nm lithography with high numerical aperture lens for 70-nm technology node
Suganaga, T. ; Kanda, N. ; Kim, J.-H. ; Yamabe, O. ; Watanabe, K. ; Furukawa, T. ; Miyoshi, S. ; Itani, T. ; Cashmore, J.S. ; Gower, M.C.
Pub. info.: Optical Microlithography XV.  Part One  pp.584-593,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
3.

Conference Proceedings
Conference Proceedings
3. Wavefront aberration measurement in 157-nm high numerical aperture lens
Kim, J.-H. ; Suganaga, T. ; Watanabe, K. ; Kanda, N. ; Itani, T. ; Cashmore, J.S. ; Gower, M.C.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1408-1419,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
4.

Conference Proceedings
Conference Proceedings
4. Contamination and degradation of 157-nm stepper optical components: field experience at International SEMATECH
Meute, J. ; Rich, G.K. ; Hien, S. ; Dean, K.R. ; Gondran, C. ; Cashmore, J.S. ; Ashworth, D. ; Webb, J.E. ; Rich, L.R. ; Dewa, P.G.
Pub. info.: Optical Microlithography XV.  Part One  pp.724-733,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
5.

Conference Proceedings
Conference Proceedings
5. High-resolution EUV Microstepper tool for resist testing and technology evaluation
Brunton, A. ; Cashmore, J.S. ; Elbourn, P. ; Elliner, G. ; Gower, M.C. ; Grunewald, P. ; Harman, M. ; Hough, S. ; McEntee, N. ; Mundair, S. ; Rees, D. ; Richards, P. ; Truffert, V. ; Wallhead, I. ; Whitfield, M.D.
Pub. info.: High-Power Laser Ablation V.  pp.681-692,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5448
6.

Conference Proceedings
Conference Proceedings
6. 157-nm lithography with extremely high numerical aperture lens for 45-nm technology node
Suganaga, T. ; Lee, J.-W. ; Kurose, E. ; Ishimaru, T. ; Furukawa, T. ; Itani, T. ; Fujii, K. ; Cashmore, J.S. ; Gower, M.
Pub. info.: Optical Microlithography XVII.  pp.104-115,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
7.

Conference Proceedings
Conference Proceedings
7. In-situ aberration monitoring using phase wheel targets
Zavyalova, L.V. ; Smith, B.W. ; Suganaga, T. ; Matsuura, S. ; Itani, T. ; Cashmore, J.S.
Pub. info.: Optical Microlithography XVII.  pp.172-184,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
8.

Conference Proceedings
Conference Proceedings
8. Correction of 157-nm lens based on phase ring aberration extraction method
Meute, J. ; Rich, G.K. ; Conley, W. ; Smith, B.W. ; Zavyalova, L.V. ; Cashmore, J.S. ; Ashworth, D. ; Webb, J.E. ; Rich, L.
Pub. info.: Optical Microlithography XVII.  pp.195-203,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377