1.

Conference Proceedings
Conference Proceedings
1. High order correction and sampling strategy for 45nm immersion lithography overlay control
B. Y. Hsueh ; G. K. C. Huang ; C.-C. Yu ; J. K. C. Hsu ; C.-C. K. Huang
Pub. info.: Metrology, inspection, and process control for microlithography XXII.  2  pp.69222Q-1-69222Q-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6922
2.

Conference Proceedings
Conference Proceedings
2. Improve overlay control and scanner utilization through high order corrections
H. M. Lin ; B. Lin ; J. Wu ; S. Chiu ; C.-C. K. Huang
Pub. info.: Metrology, inspection, and process control for microlithography XXII.  2  pp.69222R-1-69222R-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6922