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Conference Proceedings

1. Verification of high-transmittance PSM with polarization at 193-nm high-NA system

C. F. Chiu ; C. L. Chen ; J. W. Lee ; W. B. Wu ; C. L. Shih ; F. Y. Chen ; J. P. Lin

Pub. info.:	Optical microlithography XX. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6520

Conference Proceedings

2. Double patterning with multilayer hard mask shrinkage for sub-0.25 k1 lithography

H. J. Liu ; W. H. Hsieh ; C. H. Yeh ; J. S. Wu ; H. W. Chan ; W. B. Wu ; F. Y. Chen ; T. Y. Huang ; C. L. Shih ; J. P. Lin

Pub. info.:	Optical microlithography XX. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6520

Conference Proceedings

3. 70nm DRAM intra-field CDU improvement by dose modulation on mask transmittance

T. Chin ; W. B. Wu ; C. L. Shih ; P. C. Fan ; G. B. Zvi

Pub. info.:	Photomask technology 2008. 2 pp.712238-1-712238-8, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	7122

Conference Proceedings

4. Highly reliable detection and correction of pinched areas for high transmission phase shift mask

C. L. Chen ; C.-C. Liao ; P.-J. Chou ; C. L. Shih ; S. Shih

Pub. info.:	Optical Microlithography XXI. 2 pp.692437-1-692437-7, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6924