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24 results

Conference Proceedings

1. Top-surface imaging through silylation

Postnikov,S.V. ; Somervell,M.H. ; Henderson,C.L. ; Katz,S. ; Willson,C.G. ; Byers,J.D. ; Qin,A. ; Lin,Q.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 2 pp.997-1008, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

2. Improving the performance of 193-nm photoresists based on alicyclic polymers

Patterson,K. ; Okoroanyanwu,U. ; Shimokawa,T. ; Cho,S. ; Byers,J.D. ; Willson,C.G.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.425-437, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

3. Novel functional nortricyclene polymers and copolymers for 248-and 193-nm chemically amplified resists

Niu,Q.J. ; Frechet,J.M.J. ; Okoroanyanwu,U. ; Byers,J.D. ; Willson,C.G.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.113-123, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

4. New single-layer positive photoresists for 193-nm photolithography

Okoroanyanwu,U. ; Shimokawa,T. ; Byers,J.D. ; Medeiros,D.R. ; Willson,C.G. ; Niu,Q.J. ; Frechet,J.M.J. ; Allen,R.D.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.92-103, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

5. Positive- and negative-tone water-processable photoresists: a progress report

Yamada,S. ; Medeiros,D.R. ; Patterson,K. ; Jen,W.-L.K. ; Rager,T. ; Lin,Q. ; Lenci,C. ; Byers,J.D. ; Havard,J.M. ; Pasini,D. ; Frechet,J.M.J. ; Willson,C.G.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.245-253, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

6. Diffusion of photoacid generators by laser scanning confocal microscopy

Zhang,P.L. ; Webber,S.E. ; Mendenhall,J. ; Byers,J.D. ; Chao,K.K.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 2 pp.794-805, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

7. Effect of developer temperature and normality on conventional and chemically amplified photoresist dissolution

Mack,C.A. ; Maslow,M.J. ; Byers,J.D.

Pub. info.:	Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland. pp.148-160, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3741

Conference Proceedings

8. 193-nm lithography:new challenges,new worries

McCallum,M. ; Domke,W.-D. ; Byers,J.D. ; Stark,D.R.

Pub. info.:	Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland. pp.59-65, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3741

Conference Proceedings

9. Structurally variable cyclopolymers with excellent etch resistance and their application to 193-nm lithography

Klopp,J.M. ; Pasini,D. ; Frechet,J.M.J. ; Byers,J.D.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part1 pp.23-30, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999

10.

Conference Proceedings

10. 193-nm photoresists at 130-nm node:which lithographic performances for which chemical platform?

Amblard,G.R. ; Byers,J.D. ; Domke,W.D. ; Rich,G.K. ; Graffenberg,V.L. ; Patel,S. ; Miller,D.A. ; Perez,G.B.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part1 pp.32-53, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999

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