1.

Conference Proceedings
Conference Proceedings
1. PHASE FORMATION AT Pd/Si1-xGex INTERFACES
Buxbaum, A. ; Eizenberg, M. ; Raizman, A. ; Schaffler, F.
Pub. info.: Structure and properties of interfaces in materials : symposium held Decmber[i.e. December] 2-5, 1991, Boston, Massachusetts, U.S.A..  pp.273-278,  1992.  Pittsburgh.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 238
2.

Conference Proceedings
Conference Proceedings
2. COMPOUND FORMATION IN Pd METALLIZED STRAINED LAYERS OF SiCe ON Si
Buxbaum, A. ; Eizenberf, M. ; Raizmann, A. ; Schaffler, F.
Pub. info.: Phase transformation kinetics in thin films : symposium held April 29-May 1, 1991, Anaheim, California, U.S.A..  pp.151-156,  1992.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 230
3.

Conference Proceedings
Conference Proceedings
3. Photomask etch and profile control of 65nm chromeless phase lithography masks using scanning probe metrology [5853-58]
Anderson, S. A. ; Buxbaum, A. ; Kumar, A. ; Ibrahim, I.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.731-740,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
4.

Conference Proceedings
Conference Proceedings
4. Through-pitch characterization and printability for 65nm half-pitch alternating aperture phase shift applications [5853-108]
Philipsen, V. ; Leunissen, L. ; De Ruyter, R. ; Jonckheere, R. ; Marlin, P. ; Wakefield, C. ; Johnson, S. ; Cangemi, M. ; Buxbaum, A. ; Morrison, T.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.211-222,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853