1.

Conference Proceedings
Conference Proceedings
1. Experimental method for quantifying acid diffusion in chemically amplified resists
Wallraff, G. M. ; Hinsberg, W. D. ; Houle, F. A. ; Morrison, M. D. ; Larson, C. E. ; Sanchez, M, I. ; Hoffnagle, J. A. ; Brock, P. J. ; Breyta, G.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.138-148,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
2.

Conference Proceedings
Conference Proceedings
2. Approaches to etch-resistant 193-nm photoresists: performance and prospects
Allen, R. D. ; Opitz, J. ; Ito, H. ; Wallow, T. I. ; Casmier, D. V. ; DiPietro, R. A. ; Brock, P. J. ; Breyta, G. ; Sooriyakumaran, R. ; Larson, C. E. ; Hofer, D. C. ; Varanasi, P. R. ; Mewherter, A. M. ; Jayaraman, S. ; Vicari, R. ; Rhodes, L. F. ; Sun, S.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.66-77,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
3.

Conference Proceedings
Conference Proceedings
3. Development of an incremental structural parameter model for predicting reactive ion etch rates of 193-nm photoresist polymer platforms
Wallow, T. I. ; Brock, P. J. ; DiPietro, R. A. ; Allen, R. D. ; Opitz, J. ; Sooriyakumaran, R. ; Hofer, D. C. ; Mewherter, A. M. ; Cui, Y. ; Yan, W. ; Worth, G. ; Moreau, W. M. ; Meute, J. ; Byers, J. D. ; Rich, G. K. ; McCallum, M. ; Jayaraman, S. ; Vicari, R. ; Cagle, J. ; Sun, S. ; Hullihen, K. A.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.26-35,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
4.

Conference Proceedings
Conference Proceedings
4. Temperature and Field Dependence in Polymer Light Emitting Diodes
Bozano, L. D. ; Brock, P. J. ; Carter, S. A. ; Malliaras, G. G. ; Scott, J. C.
Pub. info.: Flat-panel displays and sensors - principles, materials and processes : symposium held April 4-9, 1999, San Francisco, California, U.S.A..  pp.453-458,  2000.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 558
5.

Conference Proceedings
Conference Proceedings
5. Current-Voltage Characteristics of Single Layer Polymer Light-Emitting Diodes Under High Intensity Electrical Excitation
Ruhstaller, B. ; Scott, J. C. ; Brock, P. J. ; Carter, S. A.
Pub. info.: Organic nonlinear optical materials and devices : symposium held April 6-9, 1999, San Francisco, California, U.S.A..  pp.185-,  1999.  Warrendale, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 561
6.

Conference Proceedings
Conference Proceedings
6. Photovoltage in Conjugated Polymer Photovoltaics With a Titanium Dioxide Anode
Arango, A. C. ; Brock, P. J. ; Carter, S. A.
Pub. info.: Organic nonlinear optical materials and devices : symposium held April 6-9, 1999, San Francisco, California, U.S.A..  pp.149-,  1999.  Warrendale, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 561
7.

Conference Proceedings
Conference Proceedings
7. Temperature and Field Dependence in Polymer Light-Emitting Diodes
Bozano, L. D. ; Carter, S. A. ; Scott, J. C. ; Malliaras, G. G. ; Brock, P. J.
Pub. info.: Organic nonlinear optical materials and devices : symposium held April 6-9, 1999, San Francisco, California, U.S.A..  pp.195-,  1999.  Warrendale, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 561
8.

Conference Proceedings
Conference Proceedings
8. Molecular weight tailoring in methacrylate 193-nm photoresists
Wallow, T. I. ; Brock, P. J. ; Truong, H. ; Allen, R. D. ; Opitz, J. ; Hofer, D. C.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.1106-1113,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
9.

Conference Proceedings
Conference Proceedings
9. High-resolution 248-nm bilayer resist
Lin, Q. ; Petrillo, K. E. ; Babich, K. ; Tulipe, D. C. La ; Medeiros, D. ; Mahorowala, A. ; Simons, J. P. ; Angelopoulos, M. ; Wallraff, G. M. ; Larson, C. E. ; Fenzel-Alexander, D. ; Sooriyakumaran, R. ; Breyta, G. ; Brock, P. J. ; DiPietro, R. A. ; Hofer, D. C.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.241-250,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678