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18 results

Conference Proceedings

1. Extremely fine-pitch printing with a 10×Schwarzschild optic at extreme-ultraviolet wavelengths

Shumway,M.D. ; Lee,S.H. ; Cho,C.H. ; Naulleau,P. ; Goldberg,K.A. ; Bokor,J.

Pub. info.:	Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA. pp.357-362, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4343

Conference Proceedings

2. Recent advances in EUV phase-shifting point diffraction interferometry

Naulleau,P. ; Goldberg,K.A. ; Lee,S.H. ; Chang,C.C. ; Batson,P.J. ; Attwood,D.T.,Jr. ; Bokor,J.

Pub. info.:	EUV, x-ray, and neutron optics and sources : 21-23 July 1999, Denver, Colorado. pp.154-163, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3767

Conference Proceedings

3. Characterization of the accuracy of EUV phase-shifting point diffraction interferometry

Naulleau,P. ; Goldberg,K.A. ; Lee,S.H. ; Chang,C. ; Bresloff,C.J. ; Batson,P.J. ; Attwood,D.T.,Jr. ; Bokor,J.

Pub. info.:	Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California. pp.114-123, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3331

Conference Proceedings

4. Comparison of at-wavelength inspection,printability,and simulation of nanometer-scale substrate defects in extreme ultraviolet lithography(EUVL)

Cardinale,G.F. ; Goldsmith,J.E.M. ; Ray-Chaudhuri,A.K. ; Fisher,A. ; Hector,S.D. ; Mangat,P.J.S. ; Masnyj,Z.S. ; Mancini,D.P. ; Wilkinson,B. ; Bokor,J. ; Jeong,S. ; Burkhart,S.C. ; Cerjan,C.J. ; Walton,C.C. ; Yan,P. ; Zhang,C.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.429-439, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

5. Nondestructive picosecond ultrasonic characterization of Mo/Si multilayers using a novel pump-probe scheme

Pu,N.-W. ; Jeong,S. ; Zhao,R.-A. ; Bokor,J.

Pub. info.:	18th Congress of the International Commission for Optics : Optics for the next millennium : 2-6 August, 1999, San Francisco, California. pp.196-197, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3749

Conference Proceedings

6. EUV holographic aerial image recording

Lee,S.H. ; Naulleau,P. ; Goldberg,K.A. ; Cho,C.H. ; Bokor,J.

Pub. info.:	Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.823-828, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3997

Conference Proceedings

7. Cross-correlation between actinic and visible defect inspection tool for extreme ultraviolet Lithography

Jeong,S. ; Lai,C.-W. ; Rekawa,S. ; Walton,C.C. ; Prisbrey,S.T. ; Bokor,J.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part2 pp.814-821, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

8. Direct comparison of EUV and visible-light interferometries

Goldberg,K.A. ; Naulleau,P. ; Lee,S.H. ; Chang,C. ; Bresloff,C.J. ; Gaughan,R.J. ; Chapman,H.N. ; Goldsmith,J.E.M. ; Bokor,J.

Pub. info.:	Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California. Part2 pp.635-642, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3676

Conference Proceedings

9. Picosecond ultrasonic characterization of Mo/Si multilayers for extreme ultraviolet lithography

Pu,N.-W. ; Jeong,S. ; Zhao,R.-A. ; Bokor,J.

Pub. info.:	Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California. Part2 pp.627-634, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3676

10.

Conference Proceedings

10. EUV scattering and flare of 10X projection cameras

Gullikson,E.M. ; Baker,S.L. ; Bjorkholm,J.E. ; Bokor,J. ; Coldberg,K.A. ; Goldsmith,J.E.M. ; Montcalm,C. ; Naulleau,P. ; Spiller,E.A. ; Stearns,D.G. ; Taylor,J.S. ; Underwood,J.H.

Pub. info.:	Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California. Part2 pp.717-723, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3676

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Author: Bokor,J.