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25 results

Conference Proceedings

1. New instrument to characterize materials and optics for 157-nm lithography

Boher,P. ; Evrard,P. ; Piel,J.-P. ; Stehle,J.-L.P.

Pub. info.:	Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK. pp.133-143, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4404

Conference Proceedings

2. IR spectroscopic ellipsometry for industrial characterization of semiconductors

Boher,P. ; Bucchia,M. ; Piel,J.P. ; Defranoux,C. ; Stehle,J.L. ; Pickering,C.

Pub. info.:	Optical metrology roadmap for the semiconductor, optical, and data storage industries II : 2-3 August 2001 San Diego, USA. pp.69-78, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4449

Conference Proceedings

3. Feasibility and applicability of integrated metrology using spectroscopic ellipsometry in a cluster tool

Boher,P. ; Piel,J.P. ; Stehle,J.L. ; Pickering,C. ; Tarnowka,A.

Pub. info.:	Optical metrology roadmap for the semiconductor, optical, and data storage industries II : 2-3 August 2001 San Diego, USA. pp.79-89, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4449

Conference Proceedings

4. Combined metrology including VUV spectroscopic ellipsometer and grazing x-ray reflectance for precise characterization of thin films and multilayers at 157 nm

Boher,P. ; Evrard,P. ; Piel,J.P. ; Stehle,J.L.

Pub. info.:	Optical metrology roadmap for the semiconductor, optical, and data storage industries II : 2-3 August 2001 San Diego, USA. pp.30-40, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4449

Conference Proceedings

5. Phase-shifting interference microscope for the characterization of metallic interconnections of flat panel displays

Boher,P. ; Piel,J.P. ; Stehle,J.L. ; Dubois,A. ; Boccara,A.C.

Pub. info.:	Surface scattering and diffraction for advanced metrology : 1 August 2001 San Diego, USA. pp.42-52, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4447

Conference Proceedings

6. High-accuracy characterization of antireflective coatings and photoresists by spectroscopic ellipsometry:a new tool for 300-mm-wafer technology

Boher,P. ; Defranoux,C. ; Bourtault,S. ; Stehle,J.L.P.

Pub. info.:	In-line characterization, yield reliability, and failure analysis in microelectronics manufacturing : 19-21 May 1999, Edinburgh, Scotland. pp.4-15, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3743

Conference Proceedings

7. New versatile system for characterization of antireflective coatings using combined spectroscopic ellipsometry and grazing x-ray reflectance

Boher,P. ; Evrard,P. ; Stehle,J.L.P.

Pub. info.:	Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland. pp.104-114, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3741

Conference Proceedings

8. New method for determination of the photoresist Dill parameters using spectroscopic ellipsometry

Boher,P. ; Defranoux,C. ; Piel,J.P. ; Stehle,J.L.P.

Pub. info.:	Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland. pp.92-103, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3741

Conference Proceedings

9. New purged UV spectroscopic ellipsometer to characterize thin films and multilayers at 157 nm

Boher,P. ; Piel,J.P. ; Evrard,P. ; Defranoux,C. ; Espinosa,M. ; Stehle,J.L.P.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.379-389, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

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Conference Proceedings

10. New purged UV spectroscopic ellipsometer to characterize thin films and multilayers at 157 nm

Boher,P. ; Evrard,P. ; Piel,J.-P. ; Stehle,J.-L.P.

Pub. info.:	Optical metrology roadmap for the semiconductor, optical, and data storage industries , 30-31 July 2000, San Diego, USA. pp.206-217, 2000. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4099

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