1.

Conference Proceedings
Conference Proceedings
1. MECHANICAL RESISTANCE OF FINE MICROSTRUCTURES RELATED TO PARTICLE CLEANING MECHANISMS
Tardif, F. ; Raccurt, O. ; Barbe, J.C. ; De Crecy, F. ; Besson, P. ; Danel, A.
Pub. info.: Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium.  pp.153-160,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-26
2.

Conference Proceedings
Conference Proceedings
2. EVALUATION OF ADVANCED PRE-GATE CLEANINGS
Cowache, C. ; Boelen, P. ; Kashkoush, I. ; Besson, P. ; Tardif, F.
Pub. info.: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.59-68,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-36
3.

Conference Proceedings
Conference Proceedings
3. Strained Silicon on Insulator Wafers Made by the Smart CutTM Technology
Ghyselen, B. ; Bogumilowicz, Y. ; Aulnette, C. ; Abbadie, A. ; Osternaud, B. ; Besson, P. ; Daval, N. ; Andrieu, F. ; Cayrefourq, I. ; Moriceau, H. ; Ernst, T. ; Tiberj, A. ; Rayssac, O. ; Blondeau, B. ; Mazure, C. ; Lagahe-Blanchard, C. ; Pocas, S. ; Cartier, A.-M. ; Hartmann, J.-M. ; Leduc, P. ; Nardo, C.Di ; Lugand, J.-F. ; Fournel, F. ; Semeria, M.-N. ; Kernevez, N. ; Campidelli, Y. ; Kermarrec, O. ; Morand, Y. ; Rivoire, M. ; Bensahel, D. ; Paillard, V. ; Vincent, L. ; Claverie, A. ; Boucaud, P.
Pub. info.: High-mobility group-IV materials and devices : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.83-88,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 809
4.

Conference Proceedings
Conference Proceedings
4. Fabrication of New Multilayer Heterostructures Based on Self-Assembled Layers of Poly(amic acid) with Various Electroactive Polymers
Baur, J. W. ; Besson, P. ; O'Connor, S. A. ; Rubner, M. F.
Pub. info.: Electrical, optical, and magnetic properties of organic solid state materials III : symposium held November 27-December 1, 1995, Boston, Massachusetts, U.S.A..  pp.583-,  1996.  Pittsburgh, Pennsylvania.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 413
5.

Conference Proceedings
Conference Proceedings
5. Analytical Characterization of Process Parameter Influence on the Initial Growth and Crystallinity of Atomic Layer Deposition HfO2 Thin Films
Blin, D. ; Rochat, N. ; Rolland, G. ; Holliger, P. ; Martin, F. ; Damlencourt, J.-F. ; Lardin, T. ; Besson, P. ; Haukka, S. ; Semeria, M.-N.
Pub. info.: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.233-242,  2003.  Pennington, NJ.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5133
6.

Conference Proceedings
Conference Proceedings
6. (9.4) 11:40 - 12:00 PM - High Ge Content Si/SiGe Heterostructures for Microelectronics and Optoelectronics Purposes
Bogumilowicz, Y. ; Hartmann, J.M. ; Damlencourt, J.F. ; Vandelle, B. ; Abbadie, A. ; Papon, A.-M. ; Rolland, G. ; Holliger, P. ; Di Nardo, C. ; Besson, P. ; Ernst, T. ; Billon, T. (CEA-LETI)
Pub. info.: SiGe: materials, processing, and devices : proceedings of the First international symposium.  pp.665-680,  2004.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-07
7.

Conference Proceedings
Conference Proceedings
7. (19.3) 1:50 - 2:10 PM - Understanding and Improvement of the SiGe Wet Selective Etch for the sSOI Manufacturing by the Smart Cut Process
Rayssac, O. ; Besson, P. ; Loup, V. ; Aulnette, C. ; Favier, S. ; Osternaud, B. ; Portigliatti, L. ; Cayrefourcq, I. (SOITEC)
Pub. info.: SiGe: materials, processing, and devices : proceedings of the First international symposium.  pp.1135-1144,  2004.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-07
8.

Conference Proceedings
Conference Proceedings
8. Analytical Characterization of Process Parameter Influence on the Initial Growth and Crystallinity of Atomic Layer Deposition HfO2 Thin Films
Bun, D. ; Rochat, N. ; Rolland, G. ; Holliger, P. ; Martin, F. ; Damlencourt, J.-F. ; Lardin, T. ; Besson, P. ; Haukka, S. ; Semeria, M.-N.
Pub. info.: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.233-242,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-3
9.

Conference Proceedings
Conference Proceedings
9. EUV mask blank: defect detection at 100 nm
Hue, J. ; Quesnel, E. ; Pelle, C. ; Muffato, V. ; Carini, G ; Favier, S. ; Besson, P.
Pub. info.: Emerging Lithographic Technologies VII.  2  pp.860-871,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037