Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology. pp.839-849, 2002. Pennington, NJ. Electrochemical Society
Metrology, Inspection, and Process Control for Microlithography XVII. 1 pp.150-165, 2003. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Process and Materials Characterization and Diagnostics in IC Manufacturing. pp.115-126, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Metrology, Inspection, and Process Control for Microlithography XVIII. pp.18-28, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Bunday, B.D. ; Bishop, M. ; Bennett, M.H. ; Swyers, J.R. ; Haberman-Golan, Z.
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Metrology, Inspection, and Process Control for Microlithography XVI. Part One pp.138-150, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Metrology, Inspection, and Process Control for Microlithography XVI. Part One pp.116-127, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Dixson, R.G. ; Guerry, A. ; Bennett, M.H. ; Vorburger, T.V. ; Postek, M.T., Jr.
Pub. info.:
Metrology, Inspection, and Process Control for Microlithography XVI. Part One pp.313-335, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering