1.

Conference Proceedings
Conference Proceedings
1. MODELLING OF CRYSTAL ORIGINATED PARTICLES AND THEIR IMPACT ON GATE OXIDE INTEGRITY
Bearda, T. ; Mertens, P.W. ; Woerlee, P.H. ; Wallinga, H. ; Sebmolke, R. ; Heyns, M.
Pub. info.: Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology.  pp.528-539,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-2
2.

Conference Proceedings
Conference Proceedings
2. INVITED: WAFER CLEANING: A QUANTIFIABLE PROCESS STEP
Mertens, P.W. ; Loewenstein, L. ; Vos, R. ; De Gendt, S. ; Bearda, T. ; Heynes, M.M.
Pub. info.: Silicon materials science and technology : proceedings of the Eighth International Symposium on Silicon Materials Science and Technology.  pp.592-606,  1998.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 98-1(1)
3.

Conference Proceedings
Conference Proceedings
3. Effect of Metal Contamination and Improved Cleaning Strategies
Mertens, P.W. ; Bearda, T. ; Lowewenstein, L.M. ; Martin, A.R. ; Hub, W. ; Kolbesen, B.O. ; Teerlink, I. ; Vos, R. ; Baeyens, M. ; Gendt, S.De ; Kenis, K. ; Heyns, M.M.
Pub. info.: Proceedings of the Third International Symposium on Defects in Silicon.  pp.401-413,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-1
4.

Conference Proceedings
Conference Proceedings
4. MODELLING OF CRYSTAL ORIGINATED PARTICLES AND THEIR IMPACT ON GATE OXIDE INTEGRITY
Bearda, T. ; Mertens, P.W. ; Woerlee, P.H. ; Wallinga, H. ; Sebmolke, R. ; Heyns, M.
Pub. info.: Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology.  pp.528-539,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-2
5.

Conference Proceedings
Conference Proceedings
5. REDUCTION OF SURFACE METALLIC CONTAMINATION THROUGH OPTIMIZED RINSING AND SINGLE-WAFER DRYING
Fyen, W. ; Holsteyns, F. ; Lauerhaas, J. ; Bearda, T. ; Mertens, P. ; Heyns, M.
Pub. info.: Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium.  pp.91-101,  2001.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2001-26