1.

Conference Proceedings
Conference Proceedings
1. 65nm OPC and design optimization by using simple electrical transistor simulation
Trouiller, Y. ; Devoivre, T. ; Belledent, J. ; Foussadier, F. ; Borjon, A. ; Patterson, K. ; Lucas, K. ; Couderc, C. ; Sundermann, F. ; Urbani, J. -C. ; Baron, S. ; Rody, Y. ; Chapon, J. -D. ; Arnaud, F. ; Entradas, J.
Pub. info.: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.378-388,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5756
2.

Conference Proceedings
Conference Proceedings
2. Improving model-based OPC performance for the 65-nm node through calibration set optimization
Patterson, K. ; Trouiller, Y. ; Lucas, K. ; Belledent, J. ; Borjon, A. ; Rody, Y. ; Couderc, C. ; Sundermann, F. ; Urbani, J. -C. ; Baron, S.
Pub. info.: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.294-301,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5756
3.

Conference Proceedings
Conference Proceedings
3. Investigation of model-based physical design restrictions(Invited Paper)
Lucas, K. ; Baron, S. ; Belledent, J. ; Boone, R. ; Borjon, A. ; Couderc, C. ; Patterson, K. ; Riviere-Cazaux, L. ; Rody, Y. ; Sundermann, F. ; Toublan, O. ; Trouiller, Y. ; Urbani, J. -C. ; Wimmer, K.
Pub. info.: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.85-96,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5756
4.

Conference Proceedings
Conference Proceedings
4. Modeling of electromagnetic effects from mask topography at full-chip scale
Borjon, A. ; Belledent, J. ; Shang, S. D. ; Toublan, O. ; Miramond, C. ; Patterson, K. ; Lucas, K. ; Couderc, C. ; Rody, Y. ; Sundermann, F. ; Urbani, J.-C. ; Baron, S. ; Trouiller, Y. ; Schiavone, P.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.498-505,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
5.

Conference Proceedings
Conference Proceedings
5. Stacks and Systems Based Around Metal Supported SOFCs Operating at 500-600℃
Attryde, P. ; Baker, A. ; Baron, S. ; Blake, A. ; Brandon, N. P. ; Corcoran, D. ; Gumming, D. ; Duckett, A. ; El-Koury, K. ; Haigh, D. ; Harrington, M. ; Kidd, C. ; Leah, R. ; Lewis, G. ; Matthews, C. ; Maynard, N. ; McColm, T. ; Selcuk, A. ; Schmidt, M. ; Trezona, R. ; Verdugo, L.
Pub. info.: Solid oxide fuel cells IX (SOFC-IX) : proceedings of the international symposium.  pp.113-122,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-07
6.

Technical Paper
Technical Paper
6. Flight Crew Aiding for Recovery From Subsystem Failures
Hudlica, E. ; Corker, K. ; Schudy, R. ; Baron, S.
Pub. info.: NASA Technical Reports.  (NASA-CR-181905),  pp.1-97,  1990.  National Aeronautics and Space Adminstration
7.

Conference Proceedings
Conference Proceedings
7. Through-process window resist modelling strategies for the 65 nm node [5992-46]
Borjon, A. ; Belledent, J. ; Troullier, Y. ; Patterson, K. ; Lucas, K. ; Couderc, C. ; Sundermann, F. ; Urbani, J. -C. ; Baron, S. ; Rody, Y. ; Gardin, C. ; Foussadier, F. ; Schiavone, P.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.599219-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
8.

Conference Proceedings
Conference Proceedings
8. Correction of long-range effects applied to the 65-nm node [5853-107]
Belledent, J. ; Word, J. ; Trouiller, Y. ; Couderc, C. ; Miramond, C. ; Toublan, O. ; Chapon, J.-D. ; Baron, S. ; Borjon, A. ; Foussadier, F. ; Gardin, C. ; Lucas, K. ; Patterson, K. ; Rody, Y. ; Sundermann, F.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.202-210,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
9.

Conference Proceedings
Conference Proceedings
9. Dual layer patterning failures in complex RET processes using ORC tools and pre- or post-optical proximity correction strategy [5853-100]
Couderc, C. ; Belledent, J. ; Borjon, A. ; Trouiller, Y. ; Sundermann, F. ; Lucas, K. ; Urbani, J.C. ; Foussadier, F. ; Rody, Y. ; Patterson, K. ; Baron, S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.141-151,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853