1.

Conference Proceedings
Conference Proceedings
1. Feasibility study of splitting pitch technology on 45-nm contact patterning with 0.93 NA
Y. F. Cheng ; Y. L. Chou ; T. C. Tseng ; B. Y. Hsueh ; C. H. Yang
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
2.

Conference Proceedings
Conference Proceedings
2. High order correction and sampling strategy for 45nm immersion lithography overlay control
B. Y. Hsueh ; G. K. C. Huang ; C.-C. Yu ; J. K. C. Hsu ; C.-C. K. Huang
Pub. info.: Metrology, inspection, and process control for microlithography XXII.  2  pp.69222Q-1-69222Q-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6922