1.

Conference Proceedings
Conference Proceedings
1. Impact of subwavelength CD tolerance of device performance
Balasinski, A. ; Karklin, L. ; Axelrad, V.
Pub. info.: Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA.  pp.361-368,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4692
2.

Conference Proceedings
Conference Proceedings
2. A novel design-process optimization technique based on self-consistent electrical performance evaluation
Axelrad, V. ; Shibkov, A. ; Hill, G. ; Lin, H. -J. ; Tabery, C. ; White, D. ; Boksha, V. ; Thilmany, R.
Pub. info.: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.419-426,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5756
3.

Conference Proceedings
Conference Proceedings
3. Assessing technology options for 65-nm logic circuits
Pramanik, D. ; Cote, M.L. ; Beaudette, K. ; Axelrad, V.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.30-41,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
4.

Conference Proceedings
Conference Proceedings
4. Physical and timing verification of subwavelength-scale designs: I. Lithography impact on MOSFETs
Pack, R.C. ; Axelrad, V. ; Shibkov, A. ; Boksha, V.V. ; Huckabay, J.A. ; Salik, R. ; Staud, W. ; Wang, R. ; Grobman, W.D.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.51-62,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
5.

Conference Proceedings
Conference Proceedings
5. Novel procedure for mask disposition electrical signatures of mask defects
Balasinski, A. ; Iandolo, W. ; Ray, O. ; Karklin, L. ; Axelrad, V.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.606-613,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
6.

Conference Proceedings
Conference Proceedings
6. Subwavelength lithography: an impact of photomask errors on cricuit performance
Karklin, L. ; Mazor, S. ; Joshi, D. ; Balasinski, A. ; Axelrad, V.
Pub. info.: Optical Microlithography XV.  Part One  pp.259-267,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691