1.

Conference Proceedings
Conference Proceedings
1. Importance of measurement accuracy in statistical process control
Askary,F. ; Sullivan,N.T.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.546-554,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
2.

Conference Proceedings
Conference Proceedings
2. Redefining critical in critical dimension metrology
Askary,F. ; Sullivan,N.T.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.815-826,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
3.

Conference Proceedings
Conference Proceedings
3. Benchmarking multimode CD-SEM metrology to 180 nm
Monahan,K.M. ; Askary,F. ; Elliott,R.C. ; Forcier,R.A. ; Quattrini,R. ; Sheumaker,B.L. ; Yee,J.C. ; Marchman,H.M. ; Bennett,R.D. ; Carlson,S.D. ; Sewell,H. ; McCafferty,D.C. ; Sumra,J. ; Yan,J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.480-493,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725