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17 results

Conference Proceedings

1. AlGaAs-based two-dimensional photonic crystal with defect waveguides for miniaturized ultrafast optical-pulse control-delay devices

Sugimoto,Y. ; Ikeda,N. ; Carlsson,N. ; Kawai,N. ; Inoue,K. ; Asakawa,K.

Pub. info.:	Active and passive optical components for WDM communication, 21-24 August 2001, Denver, USA. pp.180-190, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4532

Conference Proceedings

2. Chemically amplified ArF resists based on cleavable alicyclic group and the absorption band shift method

Shida,N. ; Okino,T. ; Asakawa,K. ; Ushirogouchi,T. ; Nakase,M.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.102-110, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

3. Dry-etching and nanofabrication technology perspective for novel optical devices/components

Asakawa,K. ; Sugimoto,Y.

Pub. info.:	Active and passive optical components for WDM communication, 21-24 August 2001, Denver, USA. pp.300-313, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4532

Conference Proceedings

4. Thin resist performance comparison for advanced e-beam reticle fabrication

Kobayashi,H. ; Higuchi,T. ; Asakawa,K. ; Yokoya,Y. ; Yamashiro,K.

Pub. info.:	Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan. pp.19-36, 1997. Bellingham, Washington. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3096

Conference Proceedings

5. Advanced materials for 193-nm resists

Ushirogouchi,T. ; Asakawa,K. ; Shida,N. ; Okino,T. ; Saito,S. ; Funaki,Y. ; Takaragi,A. ; Tsutsumi,K. ; Nakano,T.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part2 pp.1147-1156, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999

Conference Proceedings

6. CAR blanks feasibility study results

Yokoya,Y. ; Kobayashi,H. ; Higuchi,T. ; Asakawa,K. ; Kurikawa,A. ; Sakurai,T. ; Hashimoto,M. ; Ota,F.

Pub. info.:	16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany. pp.114-119, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3996

Conference Proceedings

7. Performance study on thin resist for advanced reticle fabrication

Kobayashi,H. ; Higuchi,T. ; Asakawa,K. ; Yokoya,Y.

Pub. info.:	16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany. pp.226-234, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3996

Conference Proceedings

8. Effect of substituent groups of phenol-derivative dissolution inhibitors on inhibition efficiency

Kihara,N. ; Saito,S. ; Naito,T. ; Ushirogouchi,T. ; Asakawa,K. ; Nakase,M.

Pub. info.:	Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California. pp.208-215, 1996. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2724

Conference Proceedings

9. Laser resist screening for iP3500/3600 replacement for advanced reticle fabrication

Ohta,F. ; Kobayashi,H. ; Higuchi,T. ; Asakawa,K.

Pub. info.:	20th Annual BACUS Symposium on Photomask Technology. pp.553-560, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4186

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Conference Proceedings

10. Initial evaluation results of DNQ-novolak resist system for advanced e-beam reticle fabrication

Yokoya,Y. ; Kobayashi,H. ; Asakawa,K.

Pub. info.:	15th Annual BACUS Symposium on Photomask Technology and Management. pp.480-489, 1995. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2621

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Author: Asakawa,K.