1.

Conference Proceedings
Conference Proceedings
1. Complementary dipole exposure solutions at 0.29 k1
Heumann, J. ; Schramm, J. ; Birnstein, A. ; Park, K. T. ; Witte, T. ; Morgana, N. ; Hennig, M. ; Pforr, R. ; Thiele, J. ; Schmidt, N. ; Aquino, C.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.327-338,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Technical Paper
Technical Paper
2. The Effects of Injector Targeting and Fuel Volatility on Fuel Dynamics in a PFI Engine During Warm-Up: Part I-Experimental Results
Russ, S. ; Stevens, J. ; Aquino, C. ; Curtis, E. ; Fry, J.
Pub. info.: 1998 International Fall Fuels and Lubricants Meeting and Exposition : SAE technical paper.  pp.1-14,  1998.  Warrendale, Penn..  Society of Automotive Engineers
Title of ser.: Society of Automotive Engineers technical paper series
Ser. no.: 1998
3.

Conference Proceedings
Conference Proceedings
3. New die-to-database inspection algorithm for inspection of 90-nm node reticles
Garcia, H.I. ; Volk, W.W. ; Watson, S. ; Hess, C. ; Aquino, C. ; Wiley, J. ; Mack, C.A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.364-374,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
4.

Conference Proceedings
Conference Proceedings
4. Detailed characterization of inspection tools: capabilities and limitations of the KLA 576 [5992-192]
Heumann, J. ; Moses, R. ; Holfeld, C. ; Schmidt, N. ; Aquino, C.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.599246-599247,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
5.

Conference Proceedings
Conference Proceedings
5. 130-nm reticle inspection using multibeam UV-wavelength database inspection
Aquino, C. ; Schlaffer, R.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.542-553,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754