1.

Conference Proceedings
Conference Proceedings
1. Application of plasma-polymerized methylsilane for 0.18-ｦﾌm photolithography
Monget,C. ; Lee,C.Y. ; Joubert,O.P. ; Amblard,G.R. ; Weidman,T.W. ; Sugiarto,D. ; Yang,J. ; Cormont,F. ; Inglebert,R.L.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.366-375,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
2.

Conference Proceedings
Conference Proceedings
2. Optical extension at the 193-nm wavelength
Zandbergen,P. ; McCallum,M. ; Amblard,G.R. ; Domke,W.-D. ; Smith,B .W. ; Zavyalova,L. ; Petersen,J.S.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.310-319,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
3.

Conference Proceedings
Conference Proceedings
3. 0.18-ｦﾌm technology at contact level:deep-UV process development by tuning NA/o and using a bottom antireflective coating
Amblard,G.R. ; Chollet,J.P.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.976-989,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
4.

Conference Proceedings
Conference Proceedings
4. Lithographic evaluation of deep-UV photoresists for 0.25-and 0.18-ｦﾌm technology design rules
Amblard,G.R.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 2  pp.890-908,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
5.

Conference Proceedings
Conference Proceedings
5. 193-nm photoresists at 130-nm node:which lithographic performances for which chemical platform?
Amblard,G.R. ; Byers,J.D. ; Domke,W.D. ; Rich,G.K. ; Graffenberg,V.L. ; Patel,S. ; Miller,D.A. ; Perez,G.B.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.32-53,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999