1.

Conference Proceedings
Conference Proceedings
1. Approaches to etch-resistant 193-nm photoresists: performance and prospects
Allen, R. D. ; Opitz, J. ; Ito, H. ; Wallow, T. I. ; Casmier, D. V. ; DiPietro, R. A. ; Brock, P. J. ; Breyta, G. ; Sooriyakumaran, R. ; Larson, C. E. ; Hofer, D. C. ; Varanasi, P. R. ; Mewherter, A. M. ; Jayaraman, S. ; Vicari, R. ; Rhodes, L. F. ; Sun, S.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.66-77,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
2.

Conference Proceedings
Conference Proceedings
2. Design and development of high-performance 193-nm positive resist based on functionalized poly(cyclicolefins)
Varanasi, P. R. ; Maniscalco, J. ; Mewherter, A. M. ; Lawson, M. C. ; Jordhamo, G. ; Allen, R. D. ; Opitz, J. ; Ito, H. ; Wallow, T. I. ; Hofer, D. C. ; Langsdorf, L. ; Jayaraman, S. ; Vicari, R.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.51-65,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
3.

Conference Proceedings
Conference Proceedings
3. Development of an incremental structural parameter model for predicting reactive ion etch rates of 193-nm photoresist polymer platforms
Wallow, T. I. ; Brock, P. J. ; DiPietro, R. A. ; Allen, R. D. ; Opitz, J. ; Sooriyakumaran, R. ; Hofer, D. C. ; Mewherter, A. M. ; Cui, Y. ; Yan, W. ; Worth, G. ; Moreau, W. M. ; Meute, J. ; Byers, J. D. ; Rich, G. K. ; McCallum, M. ; Jayaraman, S. ; Vicari, R. ; Cagle, J. ; Sun, S. ; Hullihen, K. A.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.26-35,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
4.

Conference Proceedings
Conference Proceedings
4. Block copolymers as additives: a route to enhanced resist performance
Sundararajan, N. ; Ogino, K. ; Valiyaveettil, S. ; Wang, J. ; Yang, S. ; Kameyama, A. ; Ober, C. K. ; Allen, R. D. ; Byers, J. D.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.78-85,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
5.

Conference Proceedings
Conference Proceedings
5. Polymer-platform-dependent characteristics of 193-nm photoresists
Opitz, J. ; Allen, R. D. ; Breyta, G. ; Hofer, D. C. ; Sundararajan, N. ; Ober, C. K.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.1096-1105,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
6.

Conference Proceedings
Conference Proceedings
6. Molecular weight tailoring in methacrylate 193-nm photoresists
Wallow, T. I. ; Brock, P. J. ; Truong, H. ; Allen, R. D. ; Opitz, J. ; Hofer, D. C.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.1106-1113,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
7.

Conference Proceedings
Conference Proceedings
7. Methacrylate Terpolymer Approach in the Design of a Family of Chemically Amplified Positive Resists
Allen, R. D. ; Wallraff, G. M. ; Hinsberg, W. D. ; Simpson, L. L. ; Kunz, R. R.
Pub. info.: Polymers for microelectronics : resists and dielectrics.  pp.165-,  1994.  Washington, DC.  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 537
8.

Conference Proceedings
Conference Proceedings
8. A Test for Correlation between Residual Solvent and Rates of N-Methylpyrrolidone Absorption by Polymer Films
Hinsberg, W. D. ; MacDonald, S. A. ; Snyder, C. D. ; Ito, H. ; Allen, R. D.
Pub. info.: Polymers for microelectronics : resists and dielectrics.  pp.101-,  1994.  Washington, DC.  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 537
9.

Conference Proceedings
Conference Proceedings
9. A "One-Layer" Multilayer Resist
Allen, R. D. ; MacDonald, S. A. ; Willson, C. G.
Pub. info.: Polymers for high technology : electronics and photonics.  pp.101-,  1987.  Washington, DC.  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 346
10.

Conference Proceedings
Conference Proceedings
10. Regulation of Gene Expression in the Sunflower Embryo
Adams, C. A. ; Koprivnikar, K. E. ; Allen, R. D. ; Cohen, E. A. ; Nessler, C. L. ; Thomas, T. L.
Pub. info.: Biotechnology for crop protection.  pp.240-,  1988.  Washington, DC.  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 379