1.

Technical Paper
Technical Paper
1. Shock Tunnel Studies of Scramjet Phenomena Supplement 7
Bakos, R.J. ; Morgan, R.G. ; Tuttle, S.L. ; Kelly, G.M. ; Paull, A. ; Simmons, J.M. ; Stalker, R.J. ; Pulsonetti, M.V. ; Buttsworth, D. ; Allen, G.A. ; Ward, N., Jr. ; Skinner, K. ; Neely, A.J. ; Krek, R.M.
Pub. info.: NASA Technical Reports.  (NASA-CR-191572),  pp.1-143,  1993.  National Aeronautics and Space Adminstration
2.

Technical Paper
Technical Paper
2. TRANSITION AND MIXING IN AXISYMMETRIC JETS AND VORTEX RINGS
Allen, G.A.
Pub. info.: NASA Technical Reports.  (NASA-CR-3893),  pp.1-246,  1986.  National Aeronautics and Space Administration
3.

Technical Paper
Technical Paper
3. Shock Tunnel Studies of Scramjet Phenomena Supplement 8
Stalker, R.J. ; Hollis, P. ; Allen, G.A. ; Roberts, G.T. ; Tuttle, S. ; Bakos, R.J. ; Morgan, R.G. ; Pulsonetti, M.V. ; Brescianini, C. ; Buttsworth, D.R. ; Skinner, K. ; Porter, L. ; Mee, D. ; Simmons, J. ; Kelly, G. ; Ward, N. ; Neely, A.
Pub. info.: NASA Technical Reports.  (NASA-CR-191573),  pp.1-131,  1993.  National Aeronautics and Space Adminstration
4.

Technical Paper
Technical Paper
4. A web-based analysis system for planetary entry vehicle design
Allen, G.A. ; Gage, P.J. ; Venkatapathy, E. ; Olynick, D.R. ; Wercinski, P.F.
Pub. info.: AIAA paper.  pp.1-12,  1998.  American Institute of Aeronautics and Astronautics
Title of ser.: AIAA Paper : Symposium on Multidisciplinary Analysis and Optimization
Ser. no.: 1998
5.

Conference Proceedings
Conference Proceedings
5. Alternating phase-shift masks for contact patterning
Schenker, R.E. ; Allen, G.A. ; Tejnil, E. ; Ogadhoh, S.
Pub. info.: Optical Microlithography XVI.  Part One  pp.294-302,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
6.

Conference Proceedings
Conference Proceedings
6. Lithography strategy for 65-nm node (Invited Paper)
Borodovsky, Y.A. ; Schenker, R.E. ; Allen, G.A. ; Tejnil, E. ; Hwang, D.H. ; Lo, F.-C. ; Singh, V.K. ; Gleason, R.E. ; Brandenburg, J.E. ; Bigwood, R.M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.1-14,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754