Search records | 東京工業大学附属図書館文献データベース

You can search for articles included in proceedings of international conferences and technical papers which Tokyo Tech Library holds.
Tokyo Tech members can obtain tables of contents of 17,000 foreign journals by SwetScan. Tokyo Tech Library does not cover all of them.
List of Searchable Databases

Clear Form

Search for other sites by same keyword(s).

CiNii Books

NDL Search

WebcatPlus

amazon

カーリル

WorldCat

Filter

Title:

Author:

ISBN / ISSN / Paper No:

Source Title:

Publisher:

Publication Year:

～

Clear Form

Type:

Conference Proceedings

Technical Paper

Academic Journal

Select: Check all | Remove all

Sort order

10 | 50 | 100 / Per Page

13 results

Conference Proceedings

1. Novel approximate model for resist process

Ahn,C.-N. ; Kim,H.-B. ; Baik,K.-H.

Pub. info.:	Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.752-763, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3334

Conference Proceedings

2. Accuracy of diffused aerial image model for full-chip-level optical proximity correction

Hong,J.-S. ; Kim,H.-B. ; Yune,H.-S. ; Ahn,C.-N. ; Koo,Y.-M. ; Baik,K.-H.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.1024-1032, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

3. Validation of repair process for DUV attenuated phase-shift mask

Paek,S.W. ; Kim,H.-B. ; Ahn,C.-N. ; Koo,Y.-M. ; Baik,K.-H.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.612-620, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

4. Reduction of isolated-dense bias by optimization off-axis illumination for 150-nm lithography using KrF

Kim,S.-K. ; Ahn,C.-N. ; Kim,S.-M. ; Ham,Y.-M. ; Baik,K.-H.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part2 pp.691-696, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

5. Exposure latitude analysis for dense line and space patterns by using diffused aerial image model

Ahn,C.-N. ; Kim,H.-B. ; Baik,K.-H.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.665-675, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

6. Application of alternating PSM to sub-quarter-micrometer technology using i-line lithography

Kim,H.-E. ; Ahn,C.-N. ; Kim,K.-Y. ; Baik,K.-H.

Pub. info.:	15th Annual BACUS Symposium on Photomask Technology and Management. pp.432-444, 1995. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2621

Conference Proceedings

7. Mask critical dimension error on optical lithography

Eom,T.-S. ; Koo,S.-S. ; Paek,S.-W. ; Kim,H.-B. ; Ahn,C.-N. ; Baik,K.-H.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VII. pp.32-39, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4066

Conference Proceedings

8. Feasibility study on the ArF attenuated phase-shift mask for 100-nm node lithography

Koo,S.-S. ; Kim,S.-J. ; Paek,S.-W. ; Ahn,C.-N. ; Ham,Y.-M. ; Shin,K.-S.

Pub. info.:	Optical Microlithography XIV. 4346 pp.770-777, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

Conference Proceedings

9. Application of full-chip level optical proximity correction to memory device with sub-0.10-μm design rule and ArF lithography

Yune,H.-S. ; Kim,H.-B. ; Kim,W.-H. ; Ahn,C.-N. ; Ham,Y.-M. ; Shin,K.-S.

Pub. info.:	Optical Microlithography XIV. 4346 pp.241-250, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

10.

Conference Proceedings

10. Potentialities of sub-100-nm optical lithography of alternating and phase-edge phase-shift mask for ArF lithography

Koo,S.-S. ; Kim,H.-B. ; Yune,H.-S. ; Hong,J.-S. ; Paek,S.-W. ; Eom,T.-S. ; Ahn,C.-N. ; Ham,Y.-M. ; Baik,K.-H. ; Lee,K.-Y. ; Kim,L.-J. ; Kim,H.-S.

Pub. info.:	20th Annual BACUS Symposium on Photomask Technology. pp.346-358, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4186

13 results

Select: Check all | Remove all

Sort order

10 | 50 | 100 / Per Page

Filtering by:

Author: Ahn,C.-N.