A 90-nm design-rule patterning application using alt-PSM with KrF lithography for volume manufacturing at k1=0.27

A 90-nm design-rule patterning application using alt-PSM with KrF lithography for volume manufacturing at k1=0.27

著者名:

Majoni, S. ( Philips GmbH (Germany) )
Driessen, F.A. ( Synopsis, Inc. (Netherlands) )
Kasprowicz, B.S. ( Photronics, Inc. (USA) )
Harris, P.D. ( Nikon Precision Europe GmbH (United Kingdom) )

掲載資料名:

Optical Microlithography XVII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5377

発行年:

2004

開始ページ:

1342

終了ページ:

1349

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

言語:

英語

請求記号:

P63600/5377.3

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013729
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2004 : 17th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.24-2004.02.27

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