
A 90-nm design-rule patterning application using alt-PSM with KrF lithography for volume manufacturing at k1=0.27
- 著者名:
- Majoni, S. ( Philips GmbH (Germany) )
- Driessen, F.A. ( Synopsis, Inc. (Netherlands) )
- Kasprowicz, B.S. ( Photronics, Inc. (USA) )
- Harris, P.D. ( Nikon Precision Europe GmbH (United Kingdom) )
- 掲載資料名:
- Optical Microlithography XVII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5377
- 発行年:
- 2004
- 開始ページ:
- 1342
- 終了ページ:
- 1349
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- 言語:
- 英語
- 請求記号:
- P63600/5377.3
- 資料種別:
- 国際会議録
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