
Advanced process control for deep sub-100nm gate fabrication
- Author(s):
Goto, T. K. ( Fujitsu Ltd. (Japan) ) Tajima, M. ( Fujitsu Ltd. (Japan) ) Harada, F. ( Fujitsu Ltd. (Japan) ) Kato, T. ( Fujitsu Ltd. (Japan) ) Yamazaki, T. ( Fujitsu Ltd. (Japan) ) Taguchi, T. ( Fujitsu Ltd. (Japan) ) - Publication title:
- Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5755
- Pub. Year:
- 2005
- Page(from):
- 18
- Page(to):
- 28
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457356 [0819457353]
- Language:
- English
- Call no.:
- P63600/5755
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
2
![]() SPIE-The International Society for Optical Engineering |
Electrochemical Society |
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
10
![]() SPIE-The International Society for Optical Engineering |
MRS-Materials Research Society |
SPIE-The International Society for Optical Engineering |
6
![]() SPIE-The International Society for Optical Engineering |
12
![]() SPIE-The International Society for Optical Engineering |