Aerial image simulations of soft and phase defects in 193-nm lithography for 100-nm node

Aerial image simulations of soft and phase defects in 193-nm lithography for 100-nm node

Author(s):

Driessen, F.A. ( Numerical Technologies, Inc. (USA) )

van Adrichem, P. ( IMEC (Belgium) )

Philipsen, V. ( IMEC (Belgium) )

Jonckheere, R.

Liu, H.-Y. ( Numerical Technologies, inc. (USA) )

Karklin, L.

1 more

Publication title:

Optical Microlithography XV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4691

Pub. Year:

2002

Vol.:

Part Two

Page(from):

1180

Page(to):

1189

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444370 [0819444375]

Language:

English

Call no.:

P63600/4691

Type:

Conference Proceedings

Details

TDL ID:	ZA00012526
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2002 : 15th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2002.03.05-2002.03.08

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