
Aerial image simulations of soft and phase defects in 193-nm lithography for 100-nm node
- Author(s):
Driessen, F.A. ( Numerical Technologies, Inc. (USA) ) van Adrichem, P. ( IMEC (Belgium) ) Philipsen, V. ( IMEC (Belgium) ) Jonckheere, R. Liu, H.-Y. ( Numerical Technologies, inc. (USA) ) Karklin, L. - Publication title:
- Optical Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4691
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 1180
- Page(to):
- 1189
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- Language:
- English
- Call no.:
- P63600/4691
- Type:
- Conference Proceedings
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