
Potentialities of sub-100-nm optical lithography of alternating and phase-edge phase-shift mask for ArF lithography
- Author(s):
Koo,S.-S. Kim,H.-B. Yune,H.-S. Hong,J.-S. Paek,S.-W. Eom,T.-S. Ahn,C.-N. Ham,Y.-M. Baik,K.-H. Lee,K.-Y. Kim,L.-J. Kim,H.-S. - Publication title:
- 20th Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4186
- Pub. Year:
- 2000
- Page(from):
- 346
- Page(to):
- 358
- Pages:
- 13
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819438492 [0819438499]
- Language:
- English
- Call no.:
- P63600/4186
- Type:
- Conference Proceedings
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