Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VII : 2-4 March 1988, Santa Clara, California

責任表示:

Arnold W. Yanof, chair

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

923

出版情報:

Bellingham, WA: Society of Photo-optical Instrumentation Engineers, 1988

ISSN:

0277786X

ISBN:

9780892529582 [089252958X]

請求記号:

P63600/923

資料種別:

国際会議録