Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California

責任表示:

Philliip D. Blais, chairman

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

537

出版情報:

Bellingham, WA: Society of Photo-optical Instrumentation Engineers, 1985

ISSN:

0277786X

ISBN:

9780892525720 [089252572X]

請求記号:

P63600/537

資料種別:

国際会議録