Physics and technology of high-k gate dielectrics 5 | 東京工業大学附属図書館資料名データベース

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Physics and technology of high-k gate dielectrics 5

責任表示:: S. Kar ... [et al.]
シリーズ名:: ECS transactions
シリーズ巻号:: 11(4)
出版情報:: Pennington, NJ: Electrochemical Society, 2007
ISSN:: 19385862
ISBN:: 9781566775700 [1566775701]
請求記号:: E23400/11-4
資料種別:: 国際会議録

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詳細

TDL書誌ID:	ZA00049542
シリーズＩＤ:	PA00000034
会議名:	International Symposium on High Dielectric Constant Materials and Gate Stacks ; Meeting of the Electrochemical Society
回次:	5th ; 212th
会議開催地:	Washington, D.C., USA
会議開催年:	2007.10.08-2007.10.10

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