Physics and technology of high-k gate dielectrics 6 | 東京工業大学附属図書館資料名データベース

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Physics and technology of high-k gate dielectrics 6

責任表示:: editors, S. Kar ... [et al.]
シリーズ名:: ECS transactions
シリーズ巻号:: 16(5)
出版情報:: Pennington, NJ: Electrochemical Society, 2008
ISSN:: 19385862
ISBN:: 9781566776516 [1566776511]
請求記号:: E23400/16-5
資料種別:: 国際会議録

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詳細

TDL書誌ID:	ZA00049541
シリーズＩＤ:	PA00000034
会議名:	International Symposium on High Dielectric Constant Materials and Gate Stacks ; Meeting of the Electrochemical Society
回次:	6th ; 214th
会議開催地:	Honolulu, HI, USA
会議開催年:	2008.10.12-2008.10.17

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