
Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.
- 責任表示:
- editors, H.R. Huff ... [et al.]
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 567
- 出版情報:
- Warrendale, PA: MRS - Materials Research Society, 1999
- ISSN:
- 02729172
- ISBN:
- 9781558994744 [1558994742]
- 請求記号:
- M23500/567
- 資料種別:
- 国際会議録
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