Silicide thin films - fabrication, properties, and applications : Symposium held November 27-30, 1995, Boston, Massachusetts, USA
- 責任表示:
- editors, Raymond T. Tung ... [et al.]
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 402
- 出版情報:
- Pittsburgh: MRS - Materials Research Society, 1996
- ISSN:
- 02729172
- ISBN:
- 9781558993051 [1558993053]
- 請求記号:
- M23500/402
- 資料種別:
- 国際会議録
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国際会議録
Epitaxial oxide thin films II : symposium held November 26-30, 1995, Boston, Massachusetts, U.S.A.
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