Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan

責任表示:

Naoaki Aizaki, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; supporting societies, the Japan Society of Applied Physics ... [et al.] ; published by SPIE--the International Society for Optical Engineering

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3096

出版情報:

Bellingham, Washington: SPIE-The International Society for Optical Engineering, 1997

ISSN:

0277786X

ISBN:

9780819425164 [0819425168]

請求記号:

P63600/3096

資料種別:

国際会議録