Proceedings of the Symposium on Highly Selective Dry Etching and Damage Control
- 責任表示:
- edited by G.S. Mathad, Y. Horiike ; [sponsored by the] Dielectric Sicence and Technology and Electronics Divisio
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 1993-21
- 出版情報:
- Pennington, NJ: Electrochemical Society, 1993
- ISSN:
- 01616374
- ISBN:
- 9781566770668 [1566770661]
- 請求記号:
- E23400/932473
- 資料種別:
- 国際会議録
類似資料:
Materials Research Society |
Society of Photo-optical Instrumentation Engineers |
2
国際会議録
Plasma etching processes for sub-quarter micron devices : proceedings of the international symposium
Electrochemical Society |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering | |
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering | |
Society of Photo-optical Instrumentation Engineers |