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Copper interconnects, new contact metallurgies, structures, and low-k interlevel dielectrics : proceedings of the internatioal symposium

責任表示:
editor, G.S. Mathad ; assistant editors, B.C. Baker ... [et al.] ; sponsoring divisions, Dielectric Science and Technology, Electronics, Electrodeposition
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2002-22
出版情報:
Pennington, N.J.: Electrochemical Society, 2003
ISSN:
01616374
ISBN:
9781566773799 [1566773792]
請求記号:
E23400/200222
資料種別:
国際会議録
巻号一覧
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