The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000 | 東京工業大学附属図書館資料名データベース

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The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000

責任表示:: editors, Hisham Z. Massoud ... [et al.]
シリーズ名:: Electrochemical Society Proceedings Series
シリーズ巻号:: 2000-2
出版情報:: Pennington, N.J.: Electrochemical Society, 2000
ISSN:: 01616374
ISBN:: 9781566772679 [1566772672]
請求記号:: E23400/2000-2
資料種別:: 国際会議録

巻号一覧

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詳細

TDL書誌ID:	ZA00013971
シリーズＩＤ:	PA00000028
会議名:	International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface
回次:	4th
会議開催地:	Tronto, Canada
会議開催年:	2000.05.15-2000.05.18

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