Plasma etching processes for sub-quarter micron devices : proceedings of the international symposium
- 責任表示:
- editor, G.S. Mathad ; assistant editors, D.W. Hess ... [et al.]
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 99-30
- 出版情報:
- Pennington, NJ: Electrochemical Society, 2000
- ISSN:
- 01616374
- ISBN:
- 9781566772532 [1566772532]
- 請求記号:
- E23400/99-30
- 資料種別:
- 国際会議録
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国際会議録
Proceedings of the Third International Symposium on Magnetic Materials, Processes, and Devices
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