The physics and chemistry of SiO[2] and the Si-SiO[2] interface-3, 1996 : proceedings of the Third International Symposium on the Physics and Chemistry of SiO[2] and the Si-SiO[2] Interface | 東京工業大学附属図書館資料名データベース

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The physics and chemistry of SiO[2] and the Si-SiO[2] interface-3, 1996 : proceedings of the Third International Symposium on the Physics and Chemistry of SiO[2] and the Si-SiO[2] Interface

責任表示:: editors, Hisham Z. Massoud, Edward H. Poindexter, C. Robert Helms
シリーズ名:: Electrochemical Society Proceedings Series
シリーズ巻号:: 96-1
出版情報:: Pennington, NJ: Electrochemical Society, 1996
ISSN:: 01616374
ISBN:: 9781566771511 [156677151X]
請求記号:: E23400/962115
資料種別:: 国際会議録

巻号一覧

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詳細

TDL書誌ID:	ZA00013835
シリーズＩＤ:	PA00000028
会議名:	International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface
回次:	3rd
会議開催地:	Los Angeles, CA, USA
会議開催年:	1996.05.05-1996.05.10

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